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報告_OCP2026_光寶科_800V到晶片供電_20261015

PDF 原檔:報告_OCP2026_光寶科_800V到晶片供電_20261015_original.pdf

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圖片清單(已驗證 2026-10-19)

檔名 頁 分類 親眼所見內容
報告_OCP2026_光寶科_800V到晶片供電_20261015_p2.png p2 真資料圖 800V DC 機櫃到晶片供電示意:機櫃內 Power Board(2 顆 800-50V、Hot Swap、eFuse、MCU、EMC)經 50VDC 到 IT Board,再經 IBC 與 VRM 到 GPU
報告_OCP2026_光寶科_800V到晶片供電_20261015_p4.png p4 真資料圖 800-50V DC-DC 10kW full-brick 實物與效率曲線:尺寸 119.4×63.5×14.2mm,1522 W/in3,峰值 98.7%(90A)、滿載 98.1%,標註 2027 年 12kW
報告_OCP2026_光寶科_800V到晶片供電_20261015_p9.png p9 真資料圖 50-0.8V 單級 VRM 模組實物與效率比較圖:單顆 240A、4 並聯 800A,峰值 91.4%/800A 時 87%,對比 Google 與 Meta 兩級方案 800A 時 80.3%/83.5%
報告_OCP2026_光寶科_800V到晶片供電_20261015_p10.png p10 真資料圖 800V 供電架構趨勢三張方塊圖:基準為兩個 tray、三級(800→50V IBC 16:1→6/12V→0.65V);趨勢 1 為單 tray 兩級(DCX 16:1);趨勢 2 為單級搭配晶片內 IVR(DCX 64:1/128:1/256:1 至 12/6/3.3V)
報告_OCP2026_光寶科_800V到晶片供電_20261015_p12.png p12 真資料圖 鑽石基板加微通道先進封裝:照片與爆炸圖、熱阻 0.16 與 0.1 °C/W(單面/雙面)、耐壓超過 3kV 的漏電曲線(與劍橋大學合作)

原始內容

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Powering the AI Revolution: Navigating the 800V-to-Chip Frontier Teng Long Professor, LITEON-EPIC University of Cambridge

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800V DC Rack-to-Chip Power Delivery 800-50 V 800-50 V Hot Swap MCU EMC IT Board 50 V DC EFuse VRM IBC Power Board GPU

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Power Distribution board (PDB) 800-50V Power Distribution board 800-50V DC-DC Power Brick

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800-50V DC-DC Power Brick (Full-Brick 10kW) Rating: 10kW full-brick Power density: 1522 W/in3 Function: High Voltage Bus Converter (HVBC 800-50V) Efficiency: peak 98.7%, full-load 98.1% 2027: 12kW 119.4mm 63.5mm 14.2mm Peak 98.7% @ 90 A 96.0% 96.5% 97.0% 97.5% 98.0% 98.5% 99.0% 20 40 60 80 100 120 140 160 180 200 Efficiency (%) Output Current (A)

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800-50V DC-DC Power Brick (Half-Brick 6kW) 65 mm 61 mm 14.2mm Rating: 6kW half-brick Power density: 1746 W/in3 Function: High Voltage Bus Converter (HVBC 800-50V) Efficiency: peak 98.2%, full-load 97.8% Peak 98.2% @ 55 A 95.0% 95.5% 96.0% 96.5% 97.0% 97.5% 98.0% 98.5% 10 20 30 40 50 60 70 80 90 100 110 120 Efficiency (%) Output Current (A)

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IT Board (50V) 2-Stage On-board Power Solution Power Distribution board (PDB) IT Board Computing Card

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First-Stage DC-DC converter for 12V Bus Peak 97.9% @ 500 W 95.0% 95.5% 96.0% 96.5% 97.0% 97.5% 98.0% 98.5% Efficiency (%) Output Power (W) Vin=40V Vin=48V Vin=54V Vin=60V Ta = 55°C 23.2mm 17.5 mm 7.8mm OCP compliance and qualification Mature LLC topology varient, In: 40-60V, Out: 10-15V Rating: 1500W, Size: 23.2x17.5x7.8 mm Power density: 7762 W/in3 Efficiency@54V input: peak 97.9%, full-load 96.9%

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First-Stage DC-DC converter for 6V Bus Peak 97.9% @ 300 W 93% 94% 95% 96% 97% 98% 99% Efficiency (%) Output Power (W) Vin=40V Vin=48V Vin=54V Vin=60V Ta = 55°C 23.2mm 17.5 mm 8.8mm OCP compliance and qualification Mature LLC topology variant, In: 40-60V, Out: 5-7.5V Rating: 1000W, Size: 23.2x17.5x8.8 mm Power density: 4587 W/in𝟑 Efficiency@54V input: peak 97.9%, full-load 96.6%

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50-0.8V Single-Stage Voltage Regulator Module [1] H. Gan et al., “Vertical Power Delivery for 1000 Amps Machine Learning ASICs,” APEC 2024. [2] S. Zou et al., “Vertical Power Delivery Module Design and Integration for 850A AI ASIC,” APEC 2026. Rating: 240A (single), regulated, 4 in parallel for 800A Current density: 1.28A/mm2 Function: 54-0.8 regulated and adjustable output voltage Efficiency: peak 91.4%, full-load 87% Significant higher efficiency and form factor than 2-stage 17 mm 11 mm 6.5 mm

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IT board Power board 800 V DC Power Delivery Architecture Trends Baseline: two-tray, 3 stages from 800V to core IT board 800 V Bus 50 V Bus 6 or 12 V Bus 0.65 V Trend 1: one-tray, two stages from 800V 800 V Bus 50V Bus 0.65V Trend 2: one-tray, single stage using IVR at core IT board 800 V Bus 12/6/3.3V Bus IBC 4:1 8:1 VRM GPU GPU GPU with IVR DC/DC DCX 64:1 128:1 256:1 DC/DC DCX 16:1 DC/DC IBC 16:1 IVR: Integrated Voltage Regulator

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AI assisted high frequency planar transformer design  Non-autoregressive PIC-DeepONet for transient B–H hysteresis H = baseline + history + dynamic,  AI assisted planer transformer winding design: Graph Neural Network for PCB Layer Current Sharing 6.50% core-loss error 2137 parameters

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Advanced Packaging (Diamond substrate with Microchannel) Conventional SiN AMB substrate top side bottom side Proposed diamond substrate with various silver metallization patterns  Single crystalline PVD diamond  Thin Ti (~10–50 nm) is annealed (≈500°C) to form TiC on diamond.  Ag by PVD or plating to ~0.5–5 µm for high conductance with low stress.  Electrical isolation is demonstrated >3kV limit (curve tracer limit).  Thermal Resistance: 0.16 C˚/W (Single side) and 0.1 C˚/W (double side).  In collaboration with Cambridge Integration and Cambridge University. 7.5µA leakage current diamond Silver Microchannel

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