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報告_OCP2026_劍橋_光寶科_銅燒結BGA電遷移_20261015

PDF 原檔:報告_OCP2026_劍橋_光寶科_銅燒結BGA電遷移_20261015_original.pdf

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圖片清單(已驗證 2026-10-19)

檔名 頁 分類 親眼所見內容
報告_OCP2026_劍橋_光寶科_銅燒結BGA電遷移_20261015_p2.png p2 真資料圖 問題陳述:XPU 水平/垂直供電兩種 BGA 位置示意,註電流密度預期超過 2 A/mm2;右為焊料 BGA 在 96h、120h 陰極側出現裂縫的剖面電鏡圖
報告_OCP2026_劍橋_光寶科_銅燒結BGA電遷移_20261015_p4.png p4 真資料圖 銅燒結 BGA 製程(銅膏點膠、100C/20min N2 乾燥、220C/5min 加 10MPa 燒結、剪切測試,電阻分布約 21-25 mΩ)與 4 樣品串接電遷移測試台,電流密度 50A/mm2
報告_OCP2026_劍橋_光寶科_銅燒結BGA電遷移_20261015_p5.png p5 真資料圖 電壓對時間曲線:SAC305 焊點 5 個樣品約 260-325h 開路失效(準則約 0.38V),燒結銅 5 個樣品至 900h 電壓持平約 0.21-0.23V

原始內容

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Cu Sintering BGA Interconnect for Mitigating Electromigration in High-Current AI Power Delivery Chengjie Du, Xufu Ren Department of Engineering, University of Cambridge

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Problem Statement BGA application in high-current AI power delivery Solder: Electromigration failure current density expected to surpass 2 A/mm2

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Proposed solution: Cu sintering Cu nanoparticles sintering Daisy-chained interconnects for comparing electromigration reliability of soldering and Cu sintering

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Proposed solution: Cu sintering Fabrication process and performance evaluation of sintered-Cu BGA interconnect Current density: 50A/mm2

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Proposed solution: Cu sintering Sintered-Cu BGA interconnects provide significant electromigration reliability improvement compared to solder-based counterpart Under current density of 50 A/mm2, SAC305 exhibits open-circuit failure at 300 h, Sintered-Cu BGA maintains stable electrical conduction for more than 900 h

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Proposed solution: Cu sintering Open-circuit failure of SAC305 BGA interconnect: crack formation and growth at Cathode

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Proposed solution: Cu sintering Microstructure of sintered Cu remain unchanged, showing that Cu atoms migration was negligible. This microstructural stability is consistent with the stable electrical conduction

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Proposed solution : Cu sintering For SAC305 at 300 h of EM testing, significant atomic concentration occurs at anode interface. In contrast, atomic concentration of sintered Cu interconnect shows negligible variation at 900 h of EM testing.

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Next steps Large area with hundreds of Cu sintering BGA interconnects fabrication

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